• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
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  • 优先权
    • 专利摘要:
    The invention provides a method for winding a coil. The method comprises 5 steps: Step 1: providing a first winding core, a second winding core and a third winding core aligned along an axis; Step 2: suppling a wire having a first wire part, a second wire part and a third wire part, wherein the third wire part is in between the first wire part and the second wire part; Step 3: winding the first wire part on the first winding core; Step 4: winding the second wire part on the second winding core; Step 5: winding the third wire part on the third winding core and subsequently winding the first wire part on the third winding core.
    公开号:NL2021298A
    申请号:NL2021298
    申请日:2018-07-12
    公开日:2018-08-07
    发明作者:Elias Petrus De Jong Niels；Johannes Ferdinandus Tacken Franciscus
    申请人:Asml Netherlands Bv；
    IPC主号:
    专利说明:

    Method for winding a coil, coil, motor system and lithographic apparatus
    FIELD
    [01] The present invention relates to a method for winding a coil, a coil manufactured by the method, a motor system comprising the coil, and a lithographic apparatus comprising the motor system.
    BACKGROUND
    [02] A lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus may, for example, project a pattern (also often referred to as “design layout” or “design”) of a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate (e.g., a wafer).
    [03] As semiconductor manufacturing processes continue to advance, the dimensions of circuit elements have continually been reduced while the amount of functional elements, such as transistors, per device has been steadily increasing over decades, following a trend commonly referred to as ‘Moore’s law’. To keep up with Moore’s law the semiconductor industry' is chasing technologies that enable to create increasingly smaller features. To project a pattern on a substrate a lithographic apparatus may use electromagnetic radiation. The wavelength of this radiation determines the minimum size of features which are patterned on the substrate. Typical wavelengths currently in use are 365 nm (i-line), 248 nm, 193 nm and 13.5 nm. A lithographic apparatus, which uses extreme ultraviolet (EDV) radiation, having a wavelength within a range of 4 nm to 20 nm, for example 6.7 nm or 13.5 nm, may be used to form smaller features on a substrate than a lithographic apparatus which uses, for example, radiation with a wavelength of 193 nm.
    [04] The lithographic apparatus has several motor systems. For example, one motor system is to drive the substrate and one motor system is to drive a patterning device having the pattern. There is a desire to make these motor systems faster. The faster the motor systems can drive the substrate and the patterning device, the more patterns can be projected on the substrate per unit of time. Tire more patterns projected per unit of time, the higher the throughput of the lithographic apparatus and the lower the cost per IC.
    [05] Tire coils are one of the key components in the motor system that limits the maximum acceleration. Each coil provides an electromagnetic force as a result to an electrical current through the coil. The higher the electrical current, the higher the electromagnetic force. However, the electrical current heats up the coil. The maximum electrical current is limited by a maximum heat capacity of the coil.
    [06] To improve the heat capacity, flat wire is used instead of round wire to wind the coils.
    Flat wire extends across the complete cross-section of a layer of the coil, whereas round wire does not. As a result, flat wire is better to transfer heat towards an outer surface of the coil than round wire. However, in some applications, a flat wire coil with a single layer may not be sufficient to provide enough electromagnetic force. A coil with two or more layers may be used. However, the connection between those layers may fail during use of the coil. Also, milking the connection, for example by soldering, is difficult when the connection is on the inner side of the coil.
    SUMMARY
    [07] It is an object of the invention to provide an improved method to wind a coil.
    [08] According to a first aspect of the invention there is provided a method for winding a coil.
    The method comprises 5 steps:
    Step 1: providing a first winding core, a second winding core and a third winding core aligned along an axis;
    Step 2: suppling a wire having a first wire part, a second wire part and a third wire part, wherein the third wire part is in between the first wire part and the second wire part;
    Step 3: winding the first wire part on the first winding core;
    Step 4: winding the second wire part on the second winding core;
    Step 5: winding the third wire part on the third winding core and subsequently winding the first wire part on the third winding core.
    [09] According to a second aspect of the invention, there is provided a coil manufactured by the method.
    [10] According to a third aspect of the invention, there is provided a motor system comprising the coil.
    [11] According to a fourth aspect of the invention, there is provided a lithographic apparatus comprising the motor system.
    [12] According to a fifth aspect of the invention, there is provided a winding machine arranged to perform the method.
    BRIEF DESCRIPTION OF THE DRAWINGS
    [13] Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings, in w’hich:
    Figure 1 depicts a schematic overview of a lithographic apparatus;
    Figure 2 depicts a detailed view' of a part of the lithographic apparatus of Figure 1;
    Figure 3 schematically depicts a position control system;
    Figure 4 depicts a winding machine according to an embodiment of the invention.
    Figure 5 depicts a step in a process of winding a coil.
    Figure 6 depicts a further step in the process of winding a coil.
    Figure 7 depicts another view of the step in Figure 6.
    Figure 8 depicts yet another step in the process of winding a coil.
    Figure 9 depicts the odd layer and the even layer of a dual layer coil.
    Figure 10 depicts a step in a process of winding a multi-layer coil.
    Figure 11 depicts a further step in a process of winding a multi-layer coil.
    Figure 12 depicts yet another step in a process of winding a multi-layer coil.
    Figure 13 depicts the odd layers and the even layers of a multi-layer coil Figure 14 depicts a flow diagram of the method for winding a coil.
    DETAILED DESCRIPTION
    [14] In the present document, the terms “radiation” and “beam” are used to encompass all types of electromagnetic radiation, including ultraviolet radiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) and EUV (extreme ultra-violet radiation, e.g. having a wavelength in the range of about 5-100 nm).
    [15] The term “reticle”, “mask” or “patterning device” as employed in this text may be broadly interpreted as referring to a generic patterning device that can be used to endow an incoming radiation beam with a patterned cross-section, corresponding to a pattern that is to be created in a target portion of the substrate. The term “light valve” can also be used in this context. Besides the classic mask (transmissive or reflective, binary, phase-shifting, hybrid, etc.), examples of other such patterning devices include a programmable mirror array and a programmable LCD array, [16] Figure 1 schematically depicts a lithographic apparatus LA. The lithographic apparatus LA includes an illumination system (also referred to as illuminator) IL configured to condition a radiation beam B (e.g., UV radiation, DUV radiation or EUV radiation), a mask support (e.g., a mask table) MT constructed to support a patterning device (e.g., a mask) MA and connected to a first positioner PM configured to accurately position the patterning device MA in accordance with certain parameters, a substrate support (e.g., a wafer table) WT constructed to hold a substrate (e.g., a resist coated wafer) W and connected to a second positioner PW configured to accurately position the substrate support in accordance with certain parameters, and a projection system (e.g., a refractive projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g., comprising one or more dies) of the substrate W.
    [17] In operation, the illumination system IL receives a radiation beam from a radiation source SO, e.g. via a beam delivery system BD. The illumination system IL may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic, and/or other types of optical components, or any combination thereof, for directing, shaping, and/or controlling radiation. The illuminator IL may be used to condition the radiation beam B to have a desired spatial and angular intensity distribution in its cross section at a plane of the patterning device MA.
    [18] The term “projection system” PS used herein should be broadly interpreted as encompassing various types of projection system, including refractive, reflective, catadioptric, anamorphic, magnetic, electromagnetic and/or electrostatic optical systems, or any combination thereof, as appropriate for the exposure radiation being used, and/or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term “projection lens” herein may be considered as synonymous with the more general term “projection system” PS.
    [19] The lithographic apparatus LA may be of a type wherein at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e.g., water, so as to fill a space between the projection system PS and the substrate W - which is also referred to as immersion lithography. More information on immersion techniques is given in US6952253, which is incorporated herein by reference.
    [20] The lithographic apparatus LA may also be of a type having two or more substrate supports WT (also named “dual stage”). In such “multiple stage” machine, the substrate supports WT may be used in parallel, and/or steps in preparation of a subsequent exposure of the substrate W may be carried out on the substrate W located on one of the substrate support WT while another substrate W on the other substrate support WT is being used for exposing a pattern on the other substrate W.
    [21] In addition to the substrate support WT, the lithographic apparatus LA may comprise a measurement stage. The measurement stage is arranged to hold a sensor and/or a cleaning device. The sensor may be arranged to measure a property of the projection system PS or a property of the radiation beam B. The measurement stage may hold multiple sensors. The cleaning device may be arranged to clean part of the lithographic apparatus, for example a part of the projection system PS or a part of a system that provides the immersion liquid. The measurement stage may move beneath the projection system PS when the substrate support WT is away from the projection system PS.
    [22] In operation, the radiation beam B is incident on the patterning device, e.g. mask, MA which is held on the mask support MT, and is patterned by the pattern (design layout) present on patterning device MA. Having traversed the patterning device MA, the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W. With the aid of the second positioner PW and a position measurement system IF, the substrate support WT can be moved accurately, e.g., so as to position different target portions C in the path of the radiation beam B at a focused and aligned position. Similarly, the first positioner PM and possibly another position sensor (which is not explicitly depicted in Figure 1) may be used to accurately position the patterning device MA with respect to the path of the radiation beam B. Patterning device MA and substrate W may be aligned using mask alignment marks Ml, M2 and substrate alignment marks Pl, P2. Although the substrate alignment marks Pl, P2 as illustrated occupy dedicated target portions, they may be located in spaces between target portions. Substrate alignment marks Pl, P2 are known as scribe-lane alignment marks when these are located between the target portions C.
    [23] To clarify the invention, a Cartesian coordinate system is used. The Cartesian coordinate system has three axis, i.e., an x-axis, a y-axis and a z-axis. Each of the three axis is orthogonal to the other two axis. A rotation around the x-axis is referred to as an Rx-rotation. A rotation around the y-axis is referred to as an Ry-rotation. A rotation around about the z-axis is referred to as an Rz-rotation. The x-axis and the y-axis define a horizontal plane, whereas the z-axis is in a vertical direction. The Cartesian coordinate system is not limiting the invention and is used for clarification only, instead, another coordinate system, such as a cylindrical coordinate system, may be used to clarify the invention. The orientation of the Cartesian coordinate system may be different, for example, such that the z-axis has a component along the horizontal plane.
    [24] Figure 2 shows a more detailed view of a part of the lithographic apparatus LA of Figure 1. The lithographic apparatus LA may be provided with a base frame BF, a balance mass BM, a metrology frame MF and a vibration isolation system IS. The metrology frame MF supports the projection system PS. Additionally, the metrology frame MF may support a part of the position measurement system PMS. The metrology frame MF is supported by the base frame BF via the vibration isolation system IS. The vibration isolation system IS is arranged to prevent or reduce vibrations from propagating from the base frame BF to the metrology frame MF.
    [25] The second positioner PW is arranged to accelerate the substrate support WT by providing a driving force between the substrate support WT and the balance mass BM. The driving force accelerates the substrate support WT in a desired direction. Due to the conservation of momentum, the driving force is also applied to the balance mass BM with equal magnitude, but at a direction opposite to the desired direction. Typically, the mass of the balance mass BM is significantly larger than the masses of the moving part of the second positioner PW and the substrate support WT.
    [26] In an embodiment, the second positioner PW is supported by the balance mass BM. For example, wherein the second positioner PW comprises a planar motor to levitate the substrate support WT above the balance mass BM. In another embodiment, the second positioner PW is supported by the base frame BF. For example, wherein the second positioner PW comprises a linear motor and wherein the second positioner PW comprises a bearing, like a gas bearing, to levitate the substrate support WT above the base frame BF.
    [27] The position measurement system PMS may comprise any type of sensor that is suitable to determine a position of the substrate support WT. The position measurement system PMS may comprise any type of sensor that is suitable to determine a position of the mask support MT. The sensor may be an optical sensor such as an interferometer or an encoder. The position measurement system PMS may comprise a combined system of an interferometer and an encoder. The sensor may be another type of sensor, such as a magnetic sensor, a capacitive sensor or an inductive sensor. The position measurement system PMS may determine the position relative to a reference, for example the metrology frame MF or the projection system PS. The position measurement system PMS may determine the position of the substrate table WT and/or the mask support MT by measuring the position or by measuring a time derivative of the position, such as velocity or acceleration.
    [28] The position measurement system PMS may comprise an encoder system. An encoder system is known from for example, United States patent application US2007/0058173A1, filed on September 7,2006, hereby incorporated by reference. The encoder system comprises an encoder head, a grating and a sensor. The encoder system may receive a primary radiation beam and a secondary radiation beam. Both the primary radiation beam as well as the secondary radiation beam originate from the same radiation beam, i.e., the original radiation beam. At least one of the primary radiation beam and the secondary radiation beam is created by diffracting the original radiation beam with the grating. If both the primary radiation beam and the secondary radiation beam are created by diffracting the original radiation beam with the grating, the primary radiation beam needs to have a different diffraction order than the secondary radiation beam. Different diffraction orders are, for example,+ lst order, -1st order, +2nd order and -2nd order. The encoder system optically combines the primary radiation beam and the secondary radiation beam into a combined radiation beam. A sensor in the encoder head determines a phase or phase difference of the combined radiation beam. The sensor generates a signal based on the phase or phase difference. Tire signal is representative of a position of the encoder head relative to the grating. One of the encoder head and the grating may be arranged on the substrate structure WT. The other of the encoder head and the grating may be arranged on the metrology frame MF or the base frame BF. For example, a plurality of encoder heads are arranged on the metrology frame MF, whereas a grating is arranged on a top surface of the substrate support WT. hi another example, a grating is arranged on a bottom surface of the substrate support WT, and an encoder head is arranged below the substrate support WT.
    [29] The position measurement system PMS may comprise an interferometer system. An interferometer system is known from, for example. United States patent US6,020,964, filed on July 13,1998, hereby incorporated by reference. The interferometer system may comprise abeam splitter, a mirror, a reference mirror and a sensor. A beam of radiation is split by the beam splitter into a reference beam and a measurement beam. The measurement beam propagates to the mirror and is reflected by the mirror back to the beam splitter. The reference beam propagates to the reference mirror and is reflected by the reference mirror back to the beam splitter. At the beam splitter, the measurement beam and the reference beam are combined into a combined radiation beam. The combined radiation beam is incident on the sensor. The sensor determines a phase or a frequency of the combined radiation beam. The sensor generates a signal based on the phase or the frequency. The signal is representative of a displacement of the mirror. In an embodiment, the mirror is connected to the substrate support WT. The reference mirror may be connected to the metrology frame MF. In an embodiment, the measurement beam and the reference beam are combined into a combined radiation beam by an additional optical component instead of the beam splitter.
    [30] Tire first positioner PM may comprise a long-stroke module and a short-stroke module. The short-stroke module is arranged to move the mask support MT relative to the long-stroke module with a high accuracy over a small range of movement. The long-stroke module is arranged to move the short-stroke module relative to the projection system PS with a relatively low accuracy over a large range of movement. With the combination of the long-stroke module and the short-stroke module, the first positioner PM is able to move the mask support MT relative to the projection system PS with a high accuracy over a large range of movement. Similarly, the second positioner PW may comprise a long-stroke module and a short-stroke module. The short-stroke module is arranged to move the substrate support WT relative to the long-stroke module with a high accuracy over a small range of movement. The long-stroke module is arranged to move the short-stroke module relative to the projection system PS with a relatively low accuracy over a large range of movement. With the combination of the long-stroke module and the short-stroke module, the second positioner PW is able to move the substrate support WT relative to the projection system PS w'ith a high accuracy over a large range of movement.
    [31] The first positioner PM and the second positioner PW' each are provided with an actuator to move respectively the mask support MT and the substrate support WT. The actuator may be a linear actuator to provide a driving force along a single axis, for example the y-axis. Multiple linear actuators may be applied to provide driving forces along multiple axis. The actuator may be a planar actuator to provide a driving force along multiple axis. For example, the planar actuator may be arranged to move the substrate support WT in 6 degrees of freedom. The actuator may be an electromagnetic actuator comprising at least one coil and at least one magnet. The actuator is arranged to move the at least one coil relative to the at least one magnet by applying an electrical current to the at least one coil. The actuator may be a moving-magnet type actuator, which has the at least one magnet coupled to the substrate support WT respectively to the mask support MT. The actuator may be a moving-coil type actuator which has the at least one coil coupled to the substrate support WT respectively to the mask support MT. The actuator may be a voice-coil actuator, a reluctance actuator, a Lorentz-actuator or a piezo-actuator, or any other suitable actuator.
    [32] The lithographic apparatus LA comprises a position control system PCS as schematically depicted in Figure 3. The position control system PCS comprises a setpoint generator SP, a feedforward controller FF and a feedback controller FB. The position control system PCS provides a drive signal to the actuator ACT. Tire actuator ACT may be the actuator of the first positioner PM or the second positioner PW. Tire actuator ACT drives the plant P, which may comprise the substrate support WT or the mask support MT. An output of the plant P is a position quantity such as position or velocity or acceleration. The position quantity is measured with the position measurement system PMS. The position measurement system PMS generates a signal, which is a position signal representative of the position quantity of the plant P. The setpoint generator SP generates a signal, which is a reference signal representative of a desired position quantity of the plant P. For example, the reference signal represents a desired trajectory of the substrate support WT. A difference between the reference signal and the position signal forms an input for the feedback controller FB. Based on the input, the feedback controller FB provides at least part of the drive signal for the actuator ACT. The reference signal may form an input for the feedforward controller IT. Based on the input, the feedforward controller FF provides at least part of the drive signal for the actuator ACT. The feedforward FF may make use of information about dynamical characteristics of the plant P, such as mass, stiffness, resonance modes and eigenfrequencies.
    [33] The lithographic apparatus LA has several motor system, such as the first positioner PM and the second positioner PW. The balance mass BM and the isolation system IS each may have a motor system. Such a motor system may comprise an electromagnetic actuator having at least one magnet and at least one coil. By applying an electrical current to the coil, an electromagnetic force is created between the coil and the magnet.
    [34] The following figures describe a method to wind a coil according to an embodiment of the invention. Fig. 4 depicts a winding machine 400 having a first winding core 401, a second winding core 402 and a third winding core 403. The first winding core 401, the second winding core 402 and the third winding core 403 are aligned along an axis 410, which is formed by a shaft. The third winding core 403 is in betw'een the first winding core 401 and the second winding core 402. The shaft is provided with flanges 404, 405, 406 and 407. Tire first winding core 401 is in between flanges 404 and 405. The second winding core 402 is in between flanges 406 and 407. The third winding core 403 is in betw'een flanges 405 and 406. Via a wire supply wire 420 is provided.
    [35] To explain the invention, the wire 420 has three parts which are named differently. These parts are: a first wire pail 511, a second wire pail 512 and a third wire part 513, as shown in Fig 5.
    The third wire part 513 is in betw'een the first wire part 511 and the second wire pail 512. The first wire part 511 is provided to the first winding core 401. By rotating the first winding core 401 or by rotating the wire supply relative to the first winding core 401, the first wire part 511 is wound on the first winding core 401. When enough wire 420 is on the first winding core 401, the second wire pail 512 is wound on the second winding core 402. The third wire part 513 forms a connection between the first wire part 511 and the second wire part 512, The third wire part 513 is extending from an outer surface of the first wire part 511 wound on the first winding core 401 to the second winding core 402, The second winding core 402 is at an inner surface of the second wire part 512 when wound on the second winding core 402. After winding the first wire pail 511 onto the first winding core 401, the third wire part 513 is guided towards the axis 410, after w'hich the start is made to wind the second wire part 512 onto the second winding core 402. in (lie situation as shown in Fig 5, the first wire part 511 has been wound on the first winding core 401, and the second wire part 512 is about to be wound on the second winding core 402. The winding formed by the first wire part 511 are schematically represented by the dashed lines.
    [36] As shown in Figs. 6 and 7, the second winding core 402 is rotated to wind the second wire part 512 onto the second winding core 402. Alternatively, the wire supply is rotated relative to the second winding core 402. The winding on the second winding core 402 is continued until there is sufficient wire 420 on the second winding core 402. To make a dual layer coil, the wire 420 is now cut from the wire supply.
    [37] Figs 5, 6 and 7 schematically show that the third wire part 513 goes from the first wire part 511 to the second wire part 512 through flanges 405 and 406. Flanges 405 and 406 may be provided with an opening, such as a slit, to accommodate the third wire part 513. Flange 406 may be formed by multiple parts that are placed onto the shaft after the third wire part 513 is guided to the second winding core 402. One or more of the multiple parts may have an opening or a recess to accommodate the third wire part 513.
    [38] Fig.8 shows the next step to make a dual layer coil. First the third wire part 513 is wound on the third winding core 403. Subsequently, the first wire part 511 is wound on the third winding core 403. When winding the first wire part 511 on the third winding core 403, the first wire part 511 is unwound from the first winding core 401. The first winding core 401 functions as a temporary wire supply. To wind the third wire part 513 and the first wire part 511 on the third winding core 403, the third winding core 403 and the first winding core 401 may rotate relative to each other. Alternatively, additional winding means may be used to unwind the first wire part 511 from the first winding core 401 and to wind the first wire part 511 on the third winding core 403.
    [39] Fig. 9 shows the situation after all of the first wire part 511 is unwound from the first winding core 401. Now the first wire part 511 forms an odd layer of a dual layer coil. The second wire part 512 forms an even layer of the dual layer coil. The third wire part 513 forms a connection between the odd layer and the even layer. Note that the third wire part 513 is on the inner side of the odd layer and the even layer. This has a benefit that the odd layer and the even layer are connected to each other via a reliable connection on the inner side of the coil. Also, the coil has two wire ends at an outer side of the coil, i.e. wire end 810 and wire end 820. Wire end 810 was the wire end that was w'ound on the first winding core 401. Wire end 820 was the W'ire end that was formed by cutting the wire 420 after winding the second wire part 512 on the second winding core 402. Wire ends 810 and 820 are easily accessible to be connected to, for example, an amplifier.
    [40] After the situation in Fig. 9, the flange 406 between the odd layer and the even layer may be removed. The first wire part 511 and the second wire part 512 are then moved toward each other along the axis 410. This way, the coil may be formed in its final dimensions. During this movement along the axis 410, the first wire part 511 and the second wire part 512 may be rotated relative to each other along the axis 410. By rotating, the third wire part 513 may be wound along the inner side of the coil.
    [41] In the method as depicted in Figs 4-9, it is shown that the first wire part 511 forms the odd layer of the coil, the second wire part 512 forms the even layer of the coil, and the third wire part 513 forms the connection between the odd layer and the even layer of the coil. However, in a practical implementation, it may be that a part of the third wire part 513 forms a part of the odd layer or even layer after the coil has been completed. Otherwise, part of the first wire part 511 or the second wire part 512 may form part of the connection between the odd layer and the even layer after the coil has been completed. The expressions "'first wire part 511 ”, “second wire part 512” and “third wire part 513” are made to explain the invention, but are merely defined parts of wire 420.
    [42] Next, an extension of the method is explained. With this extension, a multi-layer coil can be wound, i.e., a coil with more than two layers.
    [43] Fig. 10 shows the same features as Fig. 4. In addition. Fig. 9 show's that the winding machine 400 has a further first winding core 1401, a further second winding core 1402 and a further third winding core 1403. The further first winding core 1401, the further second winding core 1402 and the further third winding core 1403 are aligned along the axis 410. To explain the invention, several parts of wire 420 are defined. The wire 420 comprises the first wire part 511, the second wire part 512, the third wire part 513, a further first wire part 1511, a further second wire part 1512 and a further third wire part 1513. The further third wire part 1513 is in between the further first wire part 1511 and the further second wire part 1512. The second wire part 512 and the further first wire part 1511 are adjacent to each other.
    [44] Fig 10 shows, similar to what is depicted in Figs 4-6, that the first wire part 511 is W'ound on the first winding core 401. The second wire part 512 is wound on the second winding core 402.
    The third wire part 513 connects the first wire part 511 and the second wire part 512. Unlike shown in Fig. 6, wire 420 is not cut after winding the second wire part 512 on the second winding core 402. Instead, wire 420 continues to wind by winding the further first wire part 1511 on the further first winding core 1401. After winding the further first wire part 1511 on the further first winding core 1401, the further second wire part 1512 is wound on the further second winding core 1402. The further third wire part 1513 connects the further first wire part 1511 and the further second wire part 1512. There is a spacer 1410 between the flanges adjacent to respectively the second winding core 402 and the further first winding core 1401. In an embodiment, the spacer 1410 is omitted.
    [45] In this embodiment, the wire 420 is cut after winding the further second wire part 1512 on the further second winding core 1402. This way, a four-layer coil can be made. However, method can be extended to create a coil with more layers than four by adding additional winding cores. One or more groups of winding cores, i.e., a first, second and third winding core, can be added along the axis 410 to create a coil with more layers than four.
    [46] After the wire 420 is cut, as shown in Figure 11, the third wire pail 513 is wound on the third winding core 403 and subsequently the first wire part 511 is wound on the third winding core 403, similar to what is shown in Figure 7. Similarly, the further third wire part 1513 is wound on the further third winding core 1403 and subsequently the further second wire part 1512 is wound on the further third winding core 1403. When w inding the further first wire part 1511 on the further third winding core 1403, the further first wire part 1511 is unwound from the further first winding core 1401. The further first winding core 1401 functions as a temporary ware supply. To wind the further third wire part 1513 and the further first wire part 1511 on the further third winding core 1403, the further third winding core 1403 and the further first winding core 1401 may rotate relative to each other. Alternatively, additional winding means may be used to unwind the further first wire part 1511 from the further first winding core 1401 and to wind the further first wire part 1511 on the further third winding core 1403.
    [47] Fig. 12 shows the situation in which all of the first wire part 511 has been unwound from the first winding core 401, and in which all of the further first ware part 1511 has been unwound from the further first winding core 1401. A four-layer coil is being made which has two odd layers and two even layers. The odd layers are formed by the first wire part 511 and the further first wire part 1511. The even layers are formed by the second wire part 512 and the further second wire piirt 1512. The third wire part 513 forms a connection between one odd layer and one even layer. The further wire part 1513 forms a connection between the other odd layer and the other even layer. Note that the third wire part 513 and the further third wire part 1513 are on the inner side of the odd layers and the even layers. This has a benefit that the odd layers and the even layers are connected to each other via a reliable connection on the inner side of the coil. Also, the coil has two wire ends at an outer side of the coil, i.e. wire end 810 and wire end 1820. Wire end 810 was the wire end that was wound on the first winding core 401, similar as shown in Figure 9. Wire end 1820 was the wire end that was formed by cutting the wire 420 after winding the further second wire part 1512 on the further second winding core 1402. Wire ends 810 and 1820 are easily accessible to be connected to, for example, an amplifier. Bridge wire 830 is a part of wire 420 that connects the even layer formed by second wire part 512 with the odd layer formed by further first wire part 1511. The bridge wire 830 is on an outer surface of the coil. It may be beneficial to provide an electrical current to more than two layers by using only two connections, i.e., wire end 810 and wire end 1820.
    [48] Next, the further first wire part 1511 and the further second wire part 1512 may be moved towards each other along the axis 410. It may be needed to first remove the flange between the further first wire part 1511 and the further second wire part 1512. By this movement, the layers of the coil are arranged closer to each other, e.g., such that the layers are in their final position in the coil stack. By rotating the further first wire part 1511 and the further second wire part 1512 relative to each other, the further Ihird wire part 1513 may be wound along an inner side of the coil.
    [49] The second wire part 512 and the further first wire part 1511 may be moved towards each other along the axis 410. By this movement, the coil may be brought to its final dimensions. By rotating the second wire part 512 and the further first wire part 1511 relative to each other, the bridge wire 830 may be wound along the outer side of the coil.
    [50] In an embodiment, one or more of the flanges 404-407 may be omitted. For example, in an applications that has low requirements for the flatness of the coil, the flanges 404-407 do not need to be used. In the described embodiments, some of flanges 404-407 are used on two sides. For example, the left side of flange 405 is used when winding the first wire part 511 on the first winding core 401 and the right side of flange 405 is used when winding the third wire part 513 and the first wire part 511 on the third winding core 403. Instead, flange 405 may comprise a left flange and a right flange separate from the left flange. One or more of the other flanges may comprise a left flange and a right flange separate from the left flange.
    [51] The wire 420 may be flat wire, but may have any cross-section suitable for use in a coil. For example, the wire 420 may be round wire or square wire or rectangular wire or hexagonal wire. The wire 420 may comprise an insulating coating for electrical insulation. The wire 420 may be made of any suitable material such as copper, aluminium or alloys comprising copper and/or aluminium.
    [52] Fig 14 show's a flow diagram of the method for winding a coil. The method comprises the following steps. These steps are subsequently performed.
    [53] Step 1: The first winding core 401, the second winding core 402 and the third winding core 403 are provided. The first winding core 401, the second winding core 402 and the third winding core 403 are aligned along the axis 410.
    [54] Step 2: The wire 420 is provided. The wire 420 has the first wire part 511, the second wire part 512 and the third wire part 513. The third wire part 513 is in between the first wire part 511 and the second wire part 512.
    [55] Step 3: The first wire part 511 is wound on the first winding core 401.
    [56] Step 4: The second wire part 512 is wound on the second winding core 402.
    [57] Step 5: The third wire part 513 is wound on tire third winding core 403 and subsequently the first wire part 511 is wound on the third winding core 403.
    [58] The method may have step 3a in between step 3 and step 4. In step 3a, the third wire 513 is guided towards the axis 410.
    [59] The method may have step 6 after step 5. In step 6, the first w'ire part 511 and the second wire part 512 are moved towards each other along the axis 410.
    [60] The method may have during or after step 6, that the first wire part 511 and the second wire part 512 are rotated relative to each other along the axis.
    [61] The method may comprise step 4a, in between step 4 and 5. hi step 4a, step 3 is repeated by winding the further first wire 1511 on the further first winding core 1401. in step 4a, step 4 is repeated by winding the further second wire pail 1512 on the further second winding core 1402.
    [62] The method may comprise step 5a, after step 4a. in step 5a, the further third wire part 1513 is wound on the further third winding core 1403 and subsequently the further first wire part 1511 is wound on the further first winding core 1401.
    [63] The method may comprise step 6a. after step 5a. In step 6a, the further first wire pari 1511 and the further second wire part 1512 are moved towards each other along the axis 410.
    [64] The method may comprise step 6b, after step 5a. In step 6b, the second wire part 512 and the further first wire part 1511 are moved towards each other along the axis 410, [65] Note that steps 6, 6a and 6b may be performed simultaneously or consecutively. Either one of steps 6, 6a and 6b may be done first, followed by any other of the remaining steps 6, 6a and 6b.
    [66] The method described above may be performed on a winding machine 400. The winding machine 400 may be provided with motors to rotate respectively tire first winding core 401, the second winding core 402 and the third winding core 403. Manual action by an operator may be needed to operate the winding machine 400. For example, the operator may attach the wire 420 to the respectively the first winding core 401, the second winding core 402 and the third winding core 403 during the different steps in the method. The winding machine 400 may be arranged to move the wire supply along the axis and/or to move the first winding core 401, the second winding core 402 and the third winding core 403 along the axis 410 relative to the wire supply.
    [67] Although specific reference may be made in this text to the use of a lithographic apparatus in the manufacture of ICs, it should be understood that the lithographic apparatus described herein may have other applications. Possible other applications include the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin-film magnetic heads, etc.
    [68] Although specific reference may be made in this text to embodiments of the invention in the context of a lithographic apparatus, embodiments of the invention may be used in other apparatus. Embodiments of the invention may form part of a mask inspection apparatus, a metrology apparatus, or any apparatus that measures or processes an object such as a wafer (or other substrate) or mask (or other patterning device). These apparatus may be generally referred to as lithographic tools. Such a lithographic tool may use vacuum conditions or ambient (non-vacuum) conditions.
    [69] Although specific reference may have been made above to the use of embodiments of the invention in the context of optical lithography, it will be appreciated that the invention, where the context allows, is not limited to optical lithography and may be used in other applications, for example imprint lithography.
    [70] While specific embodiments of the invention have been described above, it will be appreciated that the invention may be practiced otherwise than as described. The descriptions above are intended to be illustrative, not limiting. Thus it will be apparent to one skilled in the art that modifications may be made to the invention as described without departing from the scope of the clauses set out below. Other aspects of the invention are set out as in the following numbered clauses: 1. Method for winding a coil, the method comprising: step 1: providing a first winding core, a second winding core and a third winding core aligned along an axis; step 2: suppling a wire having a first wire part, a second wire part and a third wire part, wherein the third wire part is in between the first wire part and the second wire part; step 3: winding the first wire part on the first winding core; step 4: winding the second wire part on the second winding core; step 5: winding the third wire part on the third winding core and subsequently winding the first wire part on the third winding core. 2. The method of clause 1, comprising step 3a, in between step 3 and step 4, of guiding the third wire part towards the axis. 3. The method of clause 1 or 2, comprising step 6, after step 5, of moving the first wire part and the second wire part towards each other along the axis. 4. The method of clause 3, wherein the during or after step 6, the first wire part and the second wire part are rotated relative to each other along the axis. 5. The method of one of the preceding clauses, wherein the third winding core is in between the first winding core and the second winding core. 6. The method of one of clauses 1 -5, wherein the wire has a further first wire part, a further second wire part and a further third wire part, wherein the further third wire part is in between the further first wire part and the further second wire part, wherein the second wire part and the further first wire part are adjacent to each other, the method comprising step 4a, in between step 4 and step 5, of repeating step 3 with the further first wire part on a further first winding core and repeating step 4 with a further second wire part on a further second winding core. 7. The method of clause 6, comprising step 5a, after step 4a, of winding the further third wire part on a further third winding core and subsequently winding the further first wire pen t on the further third winding core. 8. The method of clause 6 or 7, wherein the further first winding core, the further second winding core and the further third winding core are aligned along the axis. 9. The method of one clauses 7-8, comprising step 6a, after step 5a, moving the further first wire part and the further second wire part towards each other along the axis. 10. The method of one clauses 7-9, comprising step 6b of, after step 5 a, moving the second wire part and the further first wire part towards each other along the axis. 11. A coil manufactured by the method of one of the preceding clauses. 12. A coil manufactured by the method of one of clauses 6-10, wherein the coil comprises tw'o odd layers and two even layers, wherein the odd layers are formed by the first wire part and the further wire part, and wherein the even layers are formed by the second wire part and the further second wire part. 13. A motor system comprising the coil of clause 12. 14. A lithographic apparatus comprising the motor system of clause 13. 15. A winding machine arranged to perform the method of clauses 1-10, the winding machine comprising the first winding core, the second w inding core and the third winding core.
    权利要求:
    Claims (1)
    [1]
    A lithography device comprising: an exposure device adapted to provide a radiation beam; a carrier constructed to support a patterning device, the patterning device being capable of applying a pattern in a section of the radiation beam to form a patterned radiation beam; a substrate table constructed to support a substrate; and a projection device adapted to project the patterned radiation beam onto a target area of the substrate, characterized in that the substrate table is adapted to position the target area of the substrate in a focal plane of the projection device.
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